Reactive Ion Etching of Cylindrical Polyferrocenylsilane Block Copolymer Micelles: Fabrication of Ceramic Nanolines on Semiconducting Substrates
Title | Reactive Ion Etching of Cylindrical Polyferrocenylsilane Block Copolymer Micelles: Fabrication of Ceramic Nanolines on Semiconducting Substrates |
Publication Type | Journal Article |
Year of Publication | 2003 |
Authors | Cao, L, Massey, JA, Winnik*, MA, Manners*, I, Riethmüller, S, Banhart, F, Spatz, JP, Möller, M |
Journal | Advanced Functional Materials |
Volume | 13 |
Pagination | 271–276 |