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Reactive Ion Etching of Cylindrical Polyferrocenylsilane Block Copolymer Micelles: Fabrication of Ceramic Nanolines on Semiconducting Substrates

TitleReactive Ion Etching of Cylindrical Polyferrocenylsilane Block Copolymer Micelles: Fabrication of Ceramic Nanolines on Semiconducting Substrates
Publication TypeJournal Article
Year of Publication2003
AuthorsCao, L, Massey, JA, Winnik*, MA, Manners*, I, Riethmüller, S, Banhart, F, Spatz, JP, Möller, M
JournalAdvanced Functional Materials
Volume13
Pagination271–276