Cao, L.; Massey, J. A.; Winnik*, M. A.; Manners*, I.; Riethmüller, S.; Banhart, F.; Spatz, J. P.; Möller, M. Reactive Ion Etching Of Cylindrical Polyferrocenylsilane Block Copolymer Micelles: Fabrication Of Ceramic Nanolines On Semiconducting Substrates. Advanced Functional Materials 2003, 13, 271?276.